| 摘要 |
PROBLEM TO BE SOLVED: To obtain a polymer compound for photoresist, containing uniformly distributed monomer units, having small intramolecular and intermolecular compositional distributions and synthesizable at a low cost. SOLUTION: The polymer compound for photoresist can be produced by the copolymerization of a monomer mixture containing at least three kinds of (meth)acrylic acid esters comprising (A) a (meth)acrylic acid ester having a 6-20C alicyclic hydrocarbon group containing lactone ring and bonded to oxygen atom constituting the ester bond, (B) a (meth)acrylic acid ester having a 6-20C alicyclic hydrocarbon group and a group eliminable by the action of an acid and bonded to oxygen atom constituting the ester bond and (C) a (meth) acrylic acid ester having a hydrocarbon group containing a polar substituent or an oxygen-containing heterocyclic group bonded to oxygen atom constituting the ester bond. |
