发明名称 METHOD AND APPARATUS FOR INSPECTION OF SURFACE AS WELL AS DEVICE MANUFACTURING METHOD
摘要 <p>PROBLEM TO BE SOLVED: To provide a method and an apparatus, for the inspection of a surface, wherein the electrostatic charge amount on the surface of a sample can be controlled properly even when an irradiation current value is increased in order to increase a throughput, clear image data of small strain can be acquired and an inspection of high reliability can be performed. SOLUTION: The surface inspection apparatus is provided with a beam source 1 by which the sample 10 is irradiated with a charged particle beam 2 and a detection part 18 which detects charged particles from the surface of the sample. The surface of the sample 10 is covered with a resistance film 42 having a prescribed electric resistance value, the sample 10 is irradiated with the charged particle beam 2, and secondary charged particles or the like generated from the surface of the sample are detected by the detection part 18.</p>
申请公布号 JP2002148227(A) 申请公布日期 2002.05.22
申请号 JP20000340651 申请日期 2000.11.08
申请人 NIKON CORP;EBARA CORP 发明人 HAMASHIMA MUNEKI;HATAKEYAMA MASAKI;NOMICHI SHINJI;SATAKE TORU;NAKASUJI MAMORU;MURAKAMI TAKESHI;WATANABE KENJI
分类号 G01N23/225;H01J37/147;H01J37/22;H01J37/244;H01J37/28;H01L21/66;(IPC1-7):G01N23/225 主分类号 G01N23/225
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