发明名称 |
QUARTZ GLASS PRECURSOR AND METHOD OF MANUFACTURING FOR THE SAME |
摘要 |
<p>PROBLEM TO BE SOLVED: To provide a novel quartz glass precursor which uses using fumed silica as raw material and enables manufacture of the quartz glass having high purity and decreased internal bubbles in a low cost and a method of manufacturing for the same. SOLUTION: The quartz glass precursor which is a porous body consisting of the fumed silica formed by preparing a silica slurry of >=2.8 in (n) value containing the fumed silica and polar solvent, then drying this silica slurry and which is in a range of 0.1 to 1 cc/g in the total pore volume measured by a mercury porosimeter and is <=10% of the total pore volume in the integrated volume of the pores having a pore diameter of >=0.1μm is manufactured.</p> |
申请公布号 |
JP2002145633(A) |
申请公布日期 |
2002.05.22 |
申请号 |
JP20000339932 |
申请日期 |
2000.11.08 |
申请人 |
TOKUYAMA CORP |
发明人 |
KATO HIROSHI;IKEDA ATSUMI |
分类号 |
C03B20/00;C01B33/12;C01B33/18;C03B8/02;C03B19/06;(IPC1-7):C03B20/00 |
主分类号 |
C03B20/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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