PHOTO ACID GENERATOR, CHEMICAL AMPLIFICATION RESIST COMPOSITION, AND METHOD FOR FORMING PATTERN FROM THE SAME

摘要

PROBLEM TO BE SOLVED: To provide a photo acid generators which has excellent transparency for UV light having a wavelength of <=220 nm and a high photoreaction efficiency (photo acid generation efficiency), and to provide a chemical amplification resist composition which gives pattern sidewalls having excellent smoothness. SOLUTION: This photo acid generator characterized by comprising a sulfonium salt compound represented by general formula (I) and a sulfonium salt compound represented by general formula (II).