NEGATIVE TYPE RESIST COMPOSITION, RESIST PATTERN FORMING METHOD AND METHOD FOR PRODUCING ELECTRONIC DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a negative type resist composition capable of using a basic aqueous solution as a developing solution, having practical sensitivity and capable of forming a fine pattern free of swelling. SOLUTION: In the resist composition, at least a component having a vinyl ether structure protected with an acetal of formula (I), (II) or (III) in its molecule is contained and an acid generating agent is used in combination with the component.