发明名称 MANUFACTURING METHOD FOR SEMICONDUCTOR DEVICE AND SEMICONDUCTOR WAFER
摘要 PROBLEM TO BE SOLVED: To provide the manufacturing method of a semiconductor device and a semiconductor wafer for realizing an efficient probe inspection while reducing an integrated circuit chip. SOLUTION: Pads 4c and 4d for tests are provided on a division line 2 dividing a plurality of the integrated circuit chips 1. Switching circuits 6a-6d for turning ON/OFF the connection of a test circuit 3 inside the plurality of the integrated circuit chips 1, and the pads 4c and 4d for the tests arranged on the division line and switching pads 7a-7d for inputting switching signals for switching the switching circuits, are formed on the division line 2. Since the pads 4c and 4d for the tests, the switching circuits 6a-6d, and the switching pads 7a-7d on the division line are cut off at the time of division; a chip size is miniaturized without increasing the area of the semiconductor circuit chip 1.
申请公布号 JP2002141383(A) 申请公布日期 2002.05.17
申请号 JP20000338959 申请日期 2000.11.07
申请人 MATSUSHITA ELECTRIC IND CO LTD 发明人 OYA MITSUNORI;NAKANE JOJI;SUMI TATSUMI
分类号 H01L21/66;H01L21/822;H01L27/04;(IPC1-7):H01L21/66 主分类号 H01L21/66
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