CONDUCTIVE DEPOSIT MONITOR, PLASMA PROCESSOR, AND PLASMA PROCESSING METHOD

摘要

PROBLEM TO BE SOLVED: To provide a conductive deposit monitor for monitoring a conductive deposit adhered on an inner wall of a vacuum chamber, a plasma processor, and a plasma processing method. SOLUTION: A resistive value between two of terminals 11 for resistance measurement buried in an inner wall of a vacuum chamber 1, by means of a resistance measuring instrument 13 to estimate the amount of conductive deposit adhered on the inner wall of the chamber.