MEMBER FOR SUPPORTING CERAMIC SUBSTRATE FOR MANUFACTURING AND INSPECTING SEMICONDUCTOR

摘要

PROBLEM TO BE SOLVED: To provide a supporting member for supporting a ceramic heater excellent in temperature uniformity of heating surface or a ceramic substrate provided by function of an electrostatic chuck safely and effectively supporting a wafer and a wafer prober, especially structure of the supporting member having an intermediate bottom plate and a bottom plate having high flatness. SOLUTION: The supporting member for supporting the ceramic substrate for manufacturing and inspecting semiconductor comprises the substrate, the intermediate bottom plate 11, and/or the bottom plate arranged in isolation in a cylindrical casing from top to bottom in this order, wherein a number of recesses 20 are set up on at least either the intermediate bottom plate 11 or the bottom plate, and the flatness of these plates are suppressed within 0.2 mm or less.