| 摘要 |
An exposure apparatus includes a support for holding (i) a pellicle-equipped reticle, the pellicle-equipped reticle including a pellicle frame having an opening, and (ii) a nozzle disposed in an opposed relation to the opening formed in the pellicle frame of the reticle held on the support, the nozzle being used to substitute an inert gas for gas in a pellicle space surrounding the reticle, the pellicle frame and a pellicle film. By purging out air including impurities from the pellicle space with the inert gas, a reduction in transmittance of exposure light through the pellicle space can be suppressed and the exposure operation can be performed with stability.
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