发明名称 |
FLANGE OF VERTICAL CHEMICAL VAPOR DEPOSITION APPARATUS |
摘要 |
PURPOSE: A flange of a vertical chemical vapor deposition apparatus is provided to easily fix an outer tube in a die of the flange by making roughness fix an O-ring to prevent fluctuation of the O-ring. CONSTITUTION: A body(20a) is of a cylindrical type. The outer tube is placed and fixed in the die installed in the upper portion of the outer circumferential surface of the body. The O-ring(26) seals a gap between the outer tube and the die, installed on the die. A Teflon ring(27) is installed on the die adjacent to the O-ring. A ring-type roughness(30) is formed on the die to prevent the fluctuation of the O-ring placed on the die.
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申请公布号 |
KR20020036027(A) |
申请公布日期 |
2002.05.16 |
申请号 |
KR20000065878 |
申请日期 |
2000.11.07 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
LEE, JONG GEUN |
分类号 |
H01L21/205;(IPC1-7):H01L21/205 |
主分类号 |
H01L21/205 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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