发明名称 FLANGE OF VERTICAL CHEMICAL VAPOR DEPOSITION APPARATUS
摘要 PURPOSE: A flange of a vertical chemical vapor deposition apparatus is provided to easily fix an outer tube in a die of the flange by making roughness fix an O-ring to prevent fluctuation of the O-ring. CONSTITUTION: A body(20a) is of a cylindrical type. The outer tube is placed and fixed in the die installed in the upper portion of the outer circumferential surface of the body. The O-ring(26) seals a gap between the outer tube and the die, installed on the die. A Teflon ring(27) is installed on the die adjacent to the O-ring. A ring-type roughness(30) is formed on the die to prevent the fluctuation of the O-ring placed on the die.
申请公布号 KR20020036027(A) 申请公布日期 2002.05.16
申请号 KR20000065878 申请日期 2000.11.07
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 LEE, JONG GEUN
分类号 H01L21/205;(IPC1-7):H01L21/205 主分类号 H01L21/205
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