发明名称 Method for forming thin film and method for fabricating liquid crystal display using the same
摘要 A method for forming a thin film and a method for fabricating a liquid crystal display device using the same are provided. The method provides a process that is simplified. Uniform thin film characteristics can be obtained. The method for forming a thin film includes the steps of forming a diffusion barrier film on a substrate, forming a metal seed layer on the diffusion barrier film, removing a metal oxide film formed on a surface of the metal seed layer using an electric plating method, and depositing metal on the metal seed layer in which the metal oxide film is removed.
申请公布号 US2002058416(A1) 申请公布日期 2002.05.16
申请号 US20010985342 申请日期 2001.11.02
申请人 KIM SOO KIL;BAE JONG UK;KIM JAE JEONG 发明人 KIM SOO KIL;BAE JONG UK;KIM JAE JEONG
分类号 G02F1/00;H01L21/288;H01L21/3213;H01L21/336;H01L21/768;H01L29/45;H01L29/49;(IPC1-7):H01L21/44 主分类号 G02F1/00
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