发明名称 |
Method for forming thin film and method for fabricating liquid crystal display using the same |
摘要 |
A method for forming a thin film and a method for fabricating a liquid crystal display device using the same are provided. The method provides a process that is simplified. Uniform thin film characteristics can be obtained. The method for forming a thin film includes the steps of forming a diffusion barrier film on a substrate, forming a metal seed layer on the diffusion barrier film, removing a metal oxide film formed on a surface of the metal seed layer using an electric plating method, and depositing metal on the metal seed layer in which the metal oxide film is removed.
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申请公布号 |
US2002058416(A1) |
申请公布日期 |
2002.05.16 |
申请号 |
US20010985342 |
申请日期 |
2001.11.02 |
申请人 |
KIM SOO KIL;BAE JONG UK;KIM JAE JEONG |
发明人 |
KIM SOO KIL;BAE JONG UK;KIM JAE JEONG |
分类号 |
G02F1/00;H01L21/288;H01L21/3213;H01L21/336;H01L21/768;H01L29/45;H01L29/49;(IPC1-7):H01L21/44 |
主分类号 |
G02F1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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