Improvements in reticles in MEMS and IC processes

摘要

A reticle for use in the production, using photo-lithography, of a MEMS or IC device containing one or more contact or via holes, comprises one or more apertures corresponding to said holes, and arranged to define said holes during the photo-lithography process, the reticle being characterised in that said apertures are substantially circular in shape. A reticle for use in the production, using photo-lithography, of a MEMS or IC device containing one or more contact or via holes, comprises one or more apertures corresponding to said holes, and arranged to define said holes during the photo-lithography process, the reticle being characterised in that said apertures are substantially circular in shape.