| 摘要 |
<p>In the art of wet-cleaning a substrate by etching with a cleaning solution (131) prepared by dissolving hydrofluoric acid as an active component in water, using the process of measuring the concentration of a predetermined component regularly and then replenishing the cleaning solution (131) with a component for correcting the concentration at need on the basis of the result of measurement on the concentration in case of cleaning the substrate with an aqueous solution of ammonium fluoride as the cleaning solution while controlling air in a cleaning draft (111) at an exhaust rate within a predetermined range. <IMAGE></p> |
