发明名称 METHOD FOR PRODUCING HIGHLY CHLORINATED METHANE COMPOUND
摘要 PROBLEM TO BE SOLVED: To provide a method for producing a highly chlorinated methane compound, capable of voluntarily adjusting a production rate of chloroform to a high purity methylene chloride in a wider range and suppressing a production amount of carbon tetrachloride, which is a by-product, at a low level. SOLUTION: Methyl chloride and methylene chloride are allowed to react with chlorine to produce the highly chlorinated methane compounds under a condition that methyl chloride may maintain a liquid phase, methylene chloride is partially separated from reaction products containing the highly chlorinated methane compounds obtained in the reaction system, and the methylene chloride is supplied to the reaction system as methylene chloride to be used for the chlorination reaction.
申请公布号 JP2002138059(A) 申请公布日期 2002.05.14
申请号 JP20010248009 申请日期 2001.08.17
申请人 TOKUYAMA CORP 发明人 MITANI ATSUNARI;NAKAMOTO NOBUHIRO
分类号 C07C17/10;C07C19/03;C07C19/04;(IPC1-7):C07C17/10 主分类号 C07C17/10
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