| 摘要 |
<p>An apparatus for forming a multicomponent metal oxide thin film, wherein a film formation chamber is spatially divided into an upper film formation chamber and a lower film formation chamber with a stand unit having a stand for a substrate for the thin film and a baffle plate, and the openings for the discharge of a gas and for carrying in or out are disposed in the lower film formation chamber. The apparatus allows the formation of a region exhibiting extremely uniform pressure in the upper film formation chamber which results in the precise control of the composition ratio of the plural raw materials required for preparing the multicomponent metal oxide thin film.</p> |
