发明名称 SEMICONDUCTOR DEVICE AND ITS MANUFACTURING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a semiconductor device suitable for a multi-layer, coping with a high frequency and having high reliability and its manufacturing method. SOLUTION: The semiconductor device 100 is provided with an electric insulator 101, an electrode pattern 102, and a semiconductor 103 and a penetration conductor 104 arranged in the inside of the electric insulator 101 and arranged on the electrode pattern 102. The end face of the penetration conductor 104 is exposed from the electric isolator 101 in the semiconductor device 100.
申请公布号 JP2002134653(A) 申请公布日期 2002.05.10
申请号 JP20000322893 申请日期 2000.10.23
申请人 MATSUSHITA ELECTRIC IND CO LTD 发明人 ASAHI TOSHIYUKI;SUGAYA YASUHIRO;KOMATSU SHINGO;HIRANO KOICHI;YAMASHITA YOSHIHISA;SUNAKAWA YOSHITAKA;AMAMI KAZUYOSHI;NAKATANI SEIICHI
分类号 H01L23/12;H01L25/065;H01L25/07;H01L25/10;H01L25/11;H01L25/18;(IPC1-7):H01L23/12 主分类号 H01L23/12
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