发明名称 |
SEMICONDUCTOR DEVICE AND ITS MANUFACTURING METHOD |
摘要 |
PROBLEM TO BE SOLVED: To provide a semiconductor device suitable for a multi-layer, coping with a high frequency and having high reliability and its manufacturing method. SOLUTION: The semiconductor device 100 is provided with an electric insulator 101, an electrode pattern 102, and a semiconductor 103 and a penetration conductor 104 arranged in the inside of the electric insulator 101 and arranged on the electrode pattern 102. The end face of the penetration conductor 104 is exposed from the electric isolator 101 in the semiconductor device 100. |
申请公布号 |
JP2002134653(A) |
申请公布日期 |
2002.05.10 |
申请号 |
JP20000322893 |
申请日期 |
2000.10.23 |
申请人 |
MATSUSHITA ELECTRIC IND CO LTD |
发明人 |
ASAHI TOSHIYUKI;SUGAYA YASUHIRO;KOMATSU SHINGO;HIRANO KOICHI;YAMASHITA YOSHIHISA;SUNAKAWA YOSHITAKA;AMAMI KAZUYOSHI;NAKATANI SEIICHI |
分类号 |
H01L23/12;H01L25/065;H01L25/07;H01L25/10;H01L25/11;H01L25/18;(IPC1-7):H01L23/12 |
主分类号 |
H01L23/12 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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