发明名称 PLASMA EQUIPMENT
摘要 PROBLEM TO BE SOLVED: To expand design flexibility of plasma equipment restricted with an antenna size. SOLUTION: The antenna that is arranged oppositely with an installation stand 22, and supplies high frequency inside a processing container 11 is constituted with a mono-pole antenna 30.
申请公布号 JP2002134297(A) 申请公布日期 2002.05.10
申请号 JP20000328448 申请日期 2000.10.27
申请人 TOKYO ELECTRON LTD 发明人 ISHII NOBUO
分类号 H05H1/46;H01L21/302;H01L21/3065;H01L21/31 主分类号 H05H1/46
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