发明名称 SEMICONDUCTOR LASER APPARATUS AND MANUFACTURING METHOD THEREOF
摘要 PROBLEM TO BE SOLVED: To provide a semiconductor laser apparatus with superior beam property in which a threshold electric current is low and deterioration of a temperature characteristic of current-light output characteristics is small. SOLUTION: A current block layer 22 of n-AlInP having a belt-shaped opening 24 is formed on a first clad layer 20. The first upper clad layer 20 and the current block layer 22 opposed to the opening 24 are covered with a buffer layer 26 of p-Al0.5Ga0.5As. A second upper clad layer 28 consisted of p-(Al0.7Ga0.3)0.5In0.5P is formed through the buffer layer 26. The occurrence of lattice defect in a crystalline layer growing up on a surface of the current block layer 22 that faces the opening 24 can be reduced.
申请公布号 JP2002134838(A) 申请公布日期 2002.05.10
申请号 JP20000330117 申请日期 2000.10.30
申请人 MITSUBISHI ELECTRIC CORP 发明人 MIYASHITA MUNEHARU;SASAKI MOTOKO;ONO KENICHI
分类号 H01S5/323;H01S5/22;H01S5/223;(IPC1-7):H01S5/323 主分类号 H01S5/323
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