发明名称 |
SEMICONDUCTOR LASER APPARATUS AND MANUFACTURING METHOD THEREOF |
摘要 |
PROBLEM TO BE SOLVED: To provide a semiconductor laser apparatus with superior beam property in which a threshold electric current is low and deterioration of a temperature characteristic of current-light output characteristics is small. SOLUTION: A current block layer 22 of n-AlInP having a belt-shaped opening 24 is formed on a first clad layer 20. The first upper clad layer 20 and the current block layer 22 opposed to the opening 24 are covered with a buffer layer 26 of p-Al0.5Ga0.5As. A second upper clad layer 28 consisted of p-(Al0.7Ga0.3)0.5In0.5P is formed through the buffer layer 26. The occurrence of lattice defect in a crystalline layer growing up on a surface of the current block layer 22 that faces the opening 24 can be reduced.
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申请公布号 |
JP2002134838(A) |
申请公布日期 |
2002.05.10 |
申请号 |
JP20000330117 |
申请日期 |
2000.10.30 |
申请人 |
MITSUBISHI ELECTRIC CORP |
发明人 |
MIYASHITA MUNEHARU;SASAKI MOTOKO;ONO KENICHI |
分类号 |
H01S5/323;H01S5/22;H01S5/223;(IPC1-7):H01S5/323 |
主分类号 |
H01S5/323 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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