| 摘要 |
PROBLEM TO BE SOLVED: To provide a method and an apparatus for treating a base substance, which prevent contamination owing to impurities during forming a deposition film, to produce the base substance which has superior electric characteristics and provides an image of high quality. SOLUTION: This method for treating the base substance arranged in several vacuum treatment containers comprises providing switchable gate valves on wall faces of the above vacuum treatment containers, forming enclosed spaces on the other sides of the gate valves against the vacuum treatment containers, and reducing the pressure in the spaces to treat the base substance.
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