发明名称 |
High density cobalt-manganese coprecipitated nickel hydroxide and process for its production |
摘要 |
The present invention provides high density cobalt-manganese coprecipitated nickel hydroxide, particularly having a tapping density of 1.5 g/cc or greater, and a process for its production characterized by continuous supply of an aqueous solution of a nickel salt which contains a cobalt salt and a manganese salt, of a complexing agent and of an alkali metal hydroxide, into a reactor either in an inert gas atmosphere or in the presence of a reducing agent, continuous crystal growth and continuous removal.
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申请公布号 |
US2002053663(A1) |
申请公布日期 |
2002.05.09 |
申请号 |
US20010003916 |
申请日期 |
2001.11.02 |
申请人 |
TANAKA CHEMICAL CORPORATION |
发明人 |
ITO HIROYUKI;USUI TAKESHI;SHIMAKAWA MAMORU;IIDA TOYOSHI |
分类号 |
C01G53/00;H01B1/08;H01M4/50;H01M4/505;H01M4/52;H01M4/525;H01M10/0525;H01M10/36;(IPC1-7):H01B1/02 |
主分类号 |
C01G53/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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