发明名称 High density cobalt-manganese coprecipitated nickel hydroxide and process for its production
摘要 The present invention provides high density cobalt-manganese coprecipitated nickel hydroxide, particularly having a tapping density of 1.5 g/cc or greater, and a process for its production characterized by continuous supply of an aqueous solution of a nickel salt which contains a cobalt salt and a manganese salt, of a complexing agent and of an alkali metal hydroxide, into a reactor either in an inert gas atmosphere or in the presence of a reducing agent, continuous crystal growth and continuous removal.
申请公布号 US2002053663(A1) 申请公布日期 2002.05.09
申请号 US20010003916 申请日期 2001.11.02
申请人 TANAKA CHEMICAL CORPORATION 发明人 ITO HIROYUKI;USUI TAKESHI;SHIMAKAWA MAMORU;IIDA TOYOSHI
分类号 C01G53/00;H01B1/08;H01M4/50;H01M4/505;H01M4/52;H01M4/525;H01M10/0525;H01M10/36;(IPC1-7):H01B1/02 主分类号 C01G53/00
代理机构 代理人
主权项
地址