| 摘要 |
PROBLEM TO BE SOLVED: To provide an exposure device capable of performing extremely stable exposure processing by preventing the deviation of the angle of a reflection mirror reflecting light and improving a cooling mechanism so that the peeling of a reflection film formed on the reflection mirror may be prevented in an irradiating light distributing mechanism for distributing the light radiated from a light source part included in the exposure device in a specified direction. SOLUTION: This irradiating light distributing mechanism 2 used in the exposure device 1 exposing both surfaces of a base plate W by radiating, with a light having specified wavelength through masks M1 and M2, one surface and the other surface of the base plate W, is equipped with two reflection mirrors (2A and 2B) reflecting the light radiated from the light source part 10, and the angles of the mirrors (2A and 2B) are held to be at a specified angle, and each of the reflection mirrors (2A and 2B) is arranged at a specified position by moving in the horizontal direction or a vertical direction.
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