| 摘要 |
PROBLEM TO BE SOLVED: To provide a positive photoresist composition for exposure with far ultraviolet rays, which has improved line edge roughness and further the excellent resist properties such as sensitivity, resolution, resist shape, focal depth. SOLUTION: The positive photoresist composition contains a compound (A) generating an acid by the irradiation with active ray or radial ray, a resin (B) made to be alkali soluble from insoluble or hardly soluble in alkali by the action of the acid and a nitrogen-containing compound (C) having at least one specific nitrogen-containing partial structure in the molecule. |
