| 摘要 |
PROBLEM TO BE SOLVED: To provide a positive radiation sensitive composition which is improved in application uniformity and stationary wave in lithography using a short-wavelength light source for exposure capable of ultra-microfabrication and a positive chemical amplification resist. SOLUTION: The positive radiation sensitive composition contains (A) a resin which is decomposed by the action of a acid to increase the solubility in an alkali developing solution, (B) a compound which generates an acid by the irradiation of an active light or a radiation, (C) an organic basic compound, (D) a solvent and (E) a surfactant which is decolored by the irradiation of an active light or a radiation. The amount of the surfactant (E) is in the range of 50-5000 ppm of the positive radiation sensitive composition. |
