发明名称 |
METHOD FOR VIBRATION PLATING OF ELECTRONIC COMPONENT |
摘要 |
PROBLEM TO BE SOLVED: To provide a method for vibration plating of electronic components which controls a thickness distribution of plated film for an electrode by adequately vibrating and agitating electronic elements and media. SOLUTION: The method for vibration plating of electronic components which plates ceramic elements 1 by accommodating ceramic elements 1 and media 25 (for current carrying) in a basket 11 provided with an electrode 23 for plating, and by passing current to the electrode 23 for plating while immersing the basket 11 in a plating solution tank 27 and vibrating the basket, is characterized by controlling a total input of the ceramic elements 1 and media 25 so as to be height d of 3-30 mm from a bottom 11b of the basket 11.
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申请公布号 |
JP2002129396(A) |
申请公布日期 |
2002.05.09 |
申请号 |
JP20000330584 |
申请日期 |
2000.10.30 |
申请人 |
MURATA MFG CO LTD |
发明人 |
IKEDA YUTAKA;INOUE HIDEHIRO;ITO YASUNORI |
分类号 |
C25D7/00;C25D17/06;C25D17/26;H01G4/252;(IPC1-7):C25D17/26 |
主分类号 |
C25D7/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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