POLISHING METHOD AND POLISHING DEVICE

摘要

PROBLEM TO BE SOLVED: To automatically measure polishing efficiency in a polishing process. SOLUTION: A sensor 1 provided on this polishing device injects a fluid such as pure water into the layer of an abrasive pad 3 and measures a nozzle opening section pressure and a flow. An information processing device 9 calculates the passage resistance in the layer of the abrasive pad 3 from a nozzle opening section pressure signal 15 and a flow signal 14 obtained by the sensor 1 and converts the calculated passage resistance into polishing efficiency by using a prescribed table. The polishing performance of the abrasive pad 3 varying as polishing progresses is evaluated by using the detected polishing efficiency. The evaluated result is utilized for determining the execution timing of a dressing treatment to the abrasive pad and the replacing timing of the abrasive pad and for correcting the polishing time of a work.