发明名称 |
Strongly water-soluble photoacid generator resist compositions |
摘要 |
A chemically amplified resist composition that eliminates blob defects when used to produce semiconductor devices comprising: a base polymer with a protected group; a solvent; and a photoacid generator comprising an iodonium salt containing a water-soluble group of a sulphonium group containing a water-soluble group.
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申请公布号 |
US6383715(B1) |
申请公布日期 |
2002.05.07 |
申请号 |
US20000605571 |
申请日期 |
2000.06.28 |
申请人 |
INFINEON TECHNOLOGIES AG |
发明人 |
LU ZHIJIAN;GUTMAN ALOIS |
分类号 |
G03F7/004;G03F7/039;(IPC1-7):G03F7/004 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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