发明名称 Method for purifying a tantalum compound using a fluoride compound and sulfuric acid
摘要 A direct dissolution method for the purification of technical grade hydrated ammonium tantalum oxide (HATO), (NH4)2-xHxTa2O6.nH2O), and related compounds such as tantalum hydroxide and tantalum oxide is described. The method preferably uses ammonium bifluoride as fluoride source in place of the hydrofluoric acid used in the conventional methods. Other fluoride compounds such as NaF, KF, and CaF2 may be used.
申请公布号 US6383459(B1) 申请公布日期 2002.05.07
申请号 US20000652517 申请日期 2000.08.31
申请人 OSRAM SYLVANIA INC. 发明人 SINGH RAJ P.;MILLER MICHAEL J.
分类号 C01G35/00;(IPC1-7):C01G35/00;C01B9/08;C01C1/00 主分类号 C01G35/00
代理机构 代理人
主权项
地址