发明名称 Calibration of a scanning electron microscope
摘要 A scanning electron microscope (SEM) is calibrated for the effects of local charging on a measured critical dimension (CD) of a wafer by first calibrating the microscope with respect to a calibration wafer with a known CD. Local charging on a wafer may be measured as a local landing energy (LLE) so that a scale factor based on a ratio of LLEs for the measurement wafer and a calibration wafer is used to correct a measured CD for the measurement wafer.
申请公布号 US6384408(B1) 申请公布日期 2002.05.07
申请号 US19990372478 申请日期 1999.08.11
申请人 KLA-TENCOR CORPORATION 发明人 YEE JASON C.;HORDON LAURENCE S.;LIU WEIDONG;GOODSTEIN DAVID M.
分类号 G01B15/00;G01Q30/02;H01J37/02;H01J37/20;H01J37/28;H01L21/66;(IPC1-7):H01J49/00 主分类号 G01B15/00
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