| 摘要 |
PURPOSE: A substrate processing unit is provided to restrict flow of gas into a processing unit such as a cooling unit or the like, and the flow of which causes unevenness in temperature within a plane of a wafer or the like. CONSTITUTION: The processing unit comprises a transfer port provided in the casing, through which a substrate passes when the substrate is carried into the casing by a carrier for carrying the substrate, and an inflow restricting device for controlling an atmosphere outside the casing to restrict the atmosphere from flowing into the casing through the transfer port.
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