发明名称 SIC MONOCRYSTAL SUBLIMATION GROWTH DEVICE WITH A FILM-COVERED CRUCIBLE
摘要 A device for the sublimation growth of an SiC single crystal, with foil-lined crucible. The device for producing an SiC single crystal includes a crucible with a crucible inner zone. Inside this zone, there is a storage area for storing a stock of solid SiC and a crystal area in which an SiC single crystal grows onto an SiC seed crystal. A heater device is arranged outside the crucible. On a side that faces the crucible inner zone, the crucible is lined with a foil of tantalum, tungsten, niobium, molybdenum, rhenium, iridium, ruthenium, hafnium or zirconium. As a result, the crucible is sealed and a reaction between the aggressive components of the SiC gas phase and the crucible wall is prevented.
申请公布号 EP1200650(A1) 申请公布日期 2002.05.02
申请号 EP20000952899 申请日期 2000.07.04
申请人 SIEMENS AKTIENGESELLSCHAFT 发明人 STEIN, RENE;KUHN, HARALD;VOELKL, JOHANNES
分类号 C30B29/36;C30B23/00 主分类号 C30B29/36
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