发明名称 |
Method for controlling a process line in semiconductor device manufacturing |
摘要 |
<p>Using an algorithm for adding additional waiting times (60) to the process times of consecutively arranged processing devices (30) in a control unit (1) of a semiconductor device mass-production process line, the build-up of queues can be avoided resulting in equal time differences between any two manufacturing steps (101-118). The semiconductor devices (10) - the process line being the lithographic step comprising coating 104, exposure 112 and developing 116 - acquire stable process conditions and the yield is significantly increased due to a larger process window. <IMAGE></p> |
申请公布号 |
EP1202144(A1) |
申请公布日期 |
2002.05.02 |
申请号 |
EP20000123166 |
申请日期 |
2000.10.25 |
申请人 |
SEMICONDUCTOR300 GMBH & CO KG |
发明人 |
SCHEDEL, THORSTEN;SEIDEL, TORSTEN |
分类号 |
G05B19/418;H01L21/00;(IPC1-7):G05B19/418 |
主分类号 |
G05B19/418 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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