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发明名称
IMPROVED PECVD AND CVD PROCESSES FOR WNx DEPOSITION
摘要
申请公布号
KR20020031423(A)
申请公布日期
2002.05.01
申请号
KR1020027003445
申请日期
2002.03.15
申请人
发明人
分类号
H01L21/205
主分类号
H01L21/205
代理机构
代理人
主权项
地址
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