| 摘要 |
A positive photoresist composition is described, which comprises an alkali-soluble resin and 1,2-naphthoquinonediazido-5-(and/or -4-)sulfonate of a polyhydroxy compound represented by the following formula (I): <CHEM> wherein R1 to R11 are the same or different and each represents a hydrogen atom, a halogen atom, an alkyl group, an aryl group, an alkoxyl group, an acyl group or a cycloalkyl group, provided that at least one of R1 to R11 is a cycloalkyl group; A represents -CH(R12)-, in which R12 represents a hydrogen atom or an alkyl group; and m represents 2 or 3. |
