| 发明名称 |
Polymers, resist compositions and patterning process |
| 摘要 |
An acrylic resin containing hexafluoroisopropanol units has high transmittance to VUV radiation. A resist composition using the resin as a base polymer has high transparency, substrate adhesion, alkali developability and acid-elimination capability and is suited for lithographic microprocessing.
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| 申请公布号 |
US2002048724(A1) |
申请公布日期 |
2002.04.25 |
| 申请号 |
US20010947764 |
申请日期 |
2001.09.07 |
| 申请人 |
SHIN-ETSU CHEMICAL CO., LTD. |
发明人 |
HARADA YUJI;HATAKEYAMA JUN;WATANABE JUN;KAWAI YOSHIO;SASAGO MASARU;ENDO MASAYUKI;KISHIMURA SHINJI;OOTANI MICHITAKA;MIYAZAWA SATORU;TSUTSUMI KENTARO;MAEDA KAZUHIKO |
| 分类号 |
C08F20/10;G03F7/004;G03F7/039;(IPC1-7):G03F7/004;G03F7/26;C08J3/28 |
主分类号 |
C08F20/10 |
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