| 摘要 |
PROBLEM TO BE SOLVED: To manufacture a multi-layered optical film of high performance. SOLUTION: A vaporization source 2 is provided in a vacuum device 1, and a characteristic monitor substrate 3, a film thickness control monitor substrate 4 and a substrate holder 5 for installing a product substrate are also disposed therein. The characteristic monitor comprises the characteristic monitor substrate 3, a light flooding/receiving unit 6, and a measuring unit 7, and the measured value is incorporated in an operation unit 8 and used in deriving a film constant of the film deposited on the monitor. The film thickness control monitor comprises the substrate 6, a light flooding/receiving unit 9 including a monitor exchange mechanism, and a measuring unit 10, and detects the peak of the monochromatic reflectance or transmissivity, and controls the film thickness. By using the film constant obtained by the characteristic monitor, the film is deposited while being re-designed so as to be corresponding to the optical film thickness in the atmosphere successively for each layer.
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