发明名称 SURFACE TREATMENT METHOD FOR COPPER
摘要 PROBLEM TO BE SOLVED: To provide a surface treatment method for copper improving the chemical resistance of a copper circuit surface and adhesiveness between the copper surface and an insulating resin. SOLUTION: This surface treatment method consists in treating the copper surface with an aqueous solution containing an oxidizing agent to form an oxidized film, then subjecting the copper surface to immersion treatment in an aqueous solution containing sulfuric acid and further treating the copper surface with an aqueous solution consisting of formaldehyde and sodium hydroxide.
申请公布号 JP2002115078(A) 申请公布日期 2002.04.19
申请号 JP20000311066 申请日期 2000.10.11
申请人 HITACHI CHEM CO LTD 发明人 YOKOSHIMA HIROYUKI
分类号 C23C22/52;H05K3/38;(IPC1-7):C23C22/52 主分类号 C23C22/52
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