发明名称 ALIGNMENT MARK AND SEMICONDUCTOR DEVICE AND ITS MANUFACTURING METHOD
摘要 PROBLEM TO BE SOLVED: To provide an alignment mark that can achieve desired accuracy in alignment, and the manufacturing of a semiconductor device using the alignment mark. SOLUTION: A through-hole 26 passes extending from a first surface 23, where an element 25 of a substrate 22 in a semiconductor device 21 is formed, to a second surface 24 that is the back surface of the first surface 23. The through-hole 26 is filled with benzocyclobutene as resin 27, and the resin 27 projects from the second surface 24, thus using the through-hole 26 exposed onto the second surface 24 as an alignment mark 28, facilitating carrying out the alignment with naked eyes, and at the same time, improving the alignment accuracy.
申请公布号 JP2002118055(A) 申请公布日期 2002.04.19
申请号 JP20000311069 申请日期 2000.10.11
申请人 SHARP CORP 发明人 MATSUMOTO NOBUYUKI;RYU YOKU
分类号 G03F9/00;H01L21/027;(IPC1-7):H01L21/027 主分类号 G03F9/00
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