发明名称 METHOD FOR MANUFACTURING ELECTRON EMISSION ELEMENT
摘要 <p>PROBLEM TO BE SOLVED: To reduce the driving voltage of an electron emission element by means of field emission and to provide a manufacturing method for the electron emission element without varying an emission current characteristic due to storage in the atmosphere, heating in the atmosphere and heating in vacuum. SOLUTION: This manufacturing method for the electron emission element comprises a process for forming an insulation film 12 on a silicon substrate 14, a process for forming an extraction electrode 13 on the insulation film 12, a process for forming an emitter 11 by removing the insulation film 12 and the extraction electrode 13 in a position corresponding to the emitter 11 on the silicon substrate 14 by means of etching, a process for forming a porous silicon layer 15 on the surface of the emitter 11, and a process for removing the porous silicon layer 15 on the surface of the emitter 11 by means of etching.</p>
申请公布号 JP2002117754(A) 申请公布日期 2002.04.19
申请号 JP20010263745 申请日期 2001.08.31
申请人 MITSUBISHI ELECTRIC CORP 发明人 YURA SHINSUKE;INUMOCHI MITSUO;HOSONO AKIHIKO;HARADA HIROTSUGU;KINUGAWA MASARU;SHONO TOMOTAKA
分类号 H01J9/02;(IPC1-7):H01J9/02 主分类号 H01J9/02
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