发明名称 Reflection type diffraction grating
摘要 A reflection type diffraction grating according to the present invention has a structure in which a metal film as a first layer with reflectance not lower than 30% with respect to the wavelength of incident light and a transparent dielectric film as a second layer are laminated successively on the surface of the reflection type diffraction grating. With respect to the wavelength of incident light, the metal film has a refractive index selected to be not higher than 1.5 and an extinction coefficient selected to be not smaller than 6.0. The transparent dielectric film has a refractive index selected to be in a range of from 1.30 to 1.46, both inclusively, with respect to the wavelength of incident light and has an optical film thickness selected to be in a range of from 0.20lambd to 0.38lambd, both inclusively, when lambdis the wavelength of incident light.
申请公布号 US2002044359(A1) 申请公布日期 2002.04.18
申请号 US20010953219 申请日期 2001.09.17
申请人 SHIMMO KATSUHIDE;KAWAMOTO SHINJI;KUNISADA TERUFUSA;NAKAMA KENICHI 发明人 SHIMMO KATSUHIDE;KAWAMOTO SHINJI;KUNISADA TERUFUSA;NAKAMA KENICHI
分类号 G02B5/18;(IPC1-7):G02B5/18 主分类号 G02B5/18
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