ELECTRON DENSITY MEASUREMENT AND PLASMA PROCESS CONTROL SYSTEM USING A MICROWAVE OSCILLATOR LOCKED TO AN OPEN RESONATOR CONTAINING THE PLASMA,申请号KR1020027000742-传众专利搜索

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发明名称	ELECTRON DENSITY MEASUREMENT AND PLASMA PROCESS CONTROL SYSTEM USING A MICROWAVE OSCILLATOR LOCKED TO AN OPEN RESONATOR CONTAINING THE PLASMA
摘要
申请公布号	KR20020029426(A)	申请公布日期	2002.04.18
申请号	KR1020027000742	申请日期	2002.01.18
申请人		发明人
分类号	H05H1/00	主分类号	H05H1/00
代理机构		代理人
主权项
地址

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