| 摘要 |
<p>It is an object of the present invention to provide a glass member resistant against plasma corrosion suitably used as a jig material in producing semiconductors, which exhibits excellent resistance against plasma corrosion, and which is free from the generation of particles. The above problem is solved by a glass member resistant to plasma corrosion, comprising a portion to be exposed to plasma gas, which is made of a glass material containing, as the essential component, one compound component selected from the group consisting of compounds expressed by one of the chemical formulae SiO2-Al2O3-CaO, SiO2-Al2O3-MgO, SiO2-BaO-CaO, SiO2-ZrO2-CaO,SiO2-TiO2-BaO, provided that the constitution ratio of the compound components is within the vitrification range.</p> |
