发明名称 SYMMETRICAL PLANAR DIAC
摘要 The invention concerns a diac comprising a highly-doped substrate (20) of a first type of conductivity, a lightly-doped epitaxial layer (22) of the second type of conductivity including in the neighbourhood of the substrate (20) a more highly-doped part (21), a highly-doped region (24) of the first type of conductivity on the side of the upper surface of the epitaxial layer, a region (23) of the second type of conductivity more doped than the epitaxial layer beneath the region (24) of the first type of conductivity and not overlapping relative thereto, a channel retaining ring (25) of the second type of conductivity more highly doped than the epitaxial layer, outside the first region, a wall (26) of the first type of conductivity outside said ring, joining the substrate.
申请公布号 WO0231888(A1) 申请公布日期 2002.04.18
申请号 WO2001FR03178 申请日期 2001.10.12
申请人 STMICROELECTRONICS S.A.;DUCREUX, GERARD 发明人 DUCREUX, GERARD
分类号 H01L29/861 主分类号 H01L29/861
代理机构 代理人
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