| 摘要 |
While changing a focus position and a dose amount on the image plane by respective amounts, a mark including a measurement pattern and a reference pattern is transferred sequentially onto a plurality of part areas arranged in a matrix on a wafer via the projection optical system. And after the wafer is developed, an image of each of the plurality of part areas on the wafer developed is picked up, and matching with a template is performed on the image datum of each part area. Because a feature which does not disappear even with having been overdosed and of which the positional relation with the measurement pattern is known is used as the reference pattern, template-matching can be readily performed on the image datum of each part area by using the reference pattern as a reference, and an exposure condition under consideration (the best focus position) is determined based on the matching results, objective and quantitative, for the part areas (steps 237 through 249). |
