COPOLYMER RESIN, METHOD FOR PRODUCING THE SAME, AND PHOTORESIST USING THE SAME

摘要

PURPOSE: Provided are a copolymer for light source having ultrashort wavelength such as KrF or ArF, a method for producing the same, and a photoresist comprising the same. CONSTITUTION: The copolymer comprises (i) a compound of the formula as the first monomer, (ii) a maleic anhydride as the second monomer, and (iii) 1 or 2 or more of compound selected from the group consisting of 2-hydroxyethyl-5-norbonene-2-carboxylate and 3-hydroxypropyl-5-norbonene-2- carboxylate. The copolymer comprises 1 or 2 or more compound selected from the group consisting of 5-norbonene-2-carboxylic acid and monomethyl cis-5-norbonene-endo-2,3-dicarboxylate, as the fourth monomer.