| 摘要 |
PURPOSE: Method of preparing barrier rib master pattern for barrier rib transfer and method of forming barrier ribs are provided to ensure highly accurate and stable formation of a rib pattern having properly tapered side walls by projecting exposure light obliquely onto a photosensitive material with the intervention of a photomask. CONSTITUTION: In the barrier rib master pattern preparation method, a plurality of dry resist films are stacked on a substrate(31) corresponding to a desired barrier rib height by a laminator for formation of a photosensitive material layer(32). Subsequently, a photomask(33) is placed on the photosensitive material layer(32) for shielding portions of the photosensitive material layer(32) other than a rib pattern formation region from light, and then the resulting substrate is subjected to light exposure. The substrate(31) is held as tilted on a stage of the light exposure system. In turn, the substrate(31) is tilted in an opposite direction, and then subjected again to the oblique exposure. More specifically, the second light exposure is performed by projecting exposure light(H2) obliquely with respect to the substrate(31) in a direction opposite to the previous light exposure direction with respect to a plane perpendicular to the substrate(31). The photosensitive material layer(32) is developed by spraying a sodium carbonate aqueous solution onto the photosensitive material layer for formation of a rib pattern(35). |
