| 摘要 |
PURPOSE: A film forming apparatus is provided which forms on a substrate a film being mixed with little coarse or fine particles, and excellent in smoothness, adhesion and quality, and which is good at operating performance such as maintenance of low cost. CONSTITUTION: A film forming apparatus comprises a vacuum arc evaporation source(6) for generating plasma containing cathode materials by evaporating a cathode(7) through vacuum arc discharge; a film forming chamber(1) for accommodating a substrate therein and being vacuum-evacuated; and a curved plasma duct(5) having outside thereof a deflection magnetic field forming unit for guiding said plasma generated in the vacuum arc evaporation source in the vicinity of the substrate having removed coarse particles by the curved plasma duct, wherein the plasma duct has a porous member(10) on an inside wall thereof.
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