发明名称 |
THIN-FILM CAPACITOR AND ITS MANUFACTURING METHOD |
摘要 |
PROBLEM TO BE SOLVED: To prevent leakage in a thin-film capacitor via a grain boundary from becoming large, when a ferrodielectric thin film has a columnar structure. SOLUTION: Ferrodielectric thin film grows into a columnar shape, because it tends to inherit the crystallization properties of the first electrode of its underlying layer. However, by making a portion near the interface of the first electrode amorphous, the dielectric thin film is made to have a fine grain structure. This effect can substantially elongate a leakage path via the grain boundary of the upper and lower electrodes and thus realizes thin-film capacitor which has low leakage. A simple method of making the part near the surface of the first electrode amorphous is to form a thin Zr layer on a Pt electrode and to subject it to heat treatment in a nonoxidizing atmosphere. |
申请公布号 |
JP2002110935(A) |
申请公布日期 |
2002.04.12 |
申请号 |
JP20000304549 |
申请日期 |
2000.10.04 |
申请人 |
MATSUSHITA ELECTRIC IND CO LTD |
发明人 |
UEDA MICHIHITO;OTSUKA TAKASHI |
分类号 |
H01L21/8247;H01L21/8242;H01L21/8246;H01L27/105;H01L27/108;H01L29/788;H01L29/792 |
主分类号 |
H01L21/8247 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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