| 摘要 |
PROBLEM TO BE SOLVED: To provide a simulation method for predicting variation in the circuit characteristics due to variation in the production process of semiconductor devices with high accuracy at a high rate. SOLUTION: Frequency distribution of variation in the production process of semiconductor devices is inputted and a first characteristic value in the characteristics of a device constituting a semiconductor device subjected to most significant variation is determined by Monte Carlo analysis. Variation width of the production process is then determined such that a second characteristic value in the characteristics of the device in the worst case matches the first characteristic value. Finally, a third characteristic value in the circuit characteristics of the semiconductor device in the worst case is determined.
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