发明名称 METHOD FOR MANUFACTURING CHIP-ON-FILM SUBSTRATE
摘要 PROBLEM TO BE SOLVED: To provide a method for manufacturing a chip-on-film substrate, where a copper layer can remain around sprocket holes effectively, without increasing pattern defective due to occurrence of short or the like and with little loss of material. SOLUTION: This method for manufacturing the chip-on-film substrate, where sprocket holes are formed on a tape-like two-layer base material where the copper layer is adhered directly, to a polyimide based film, and a wiring circuit pattern is then formed on the side of the copper layer through photoresist coating, drying, exposure, developing, etching, peeling of a photoresist; and removal and furthermore, as necessary, that solder resist coating, hardening, and plating have been carried out, is characterized in that the photoresist coating is carried out only to a wiring circuit pattern forming part, and after the developing, resist has been formed only to the sprocket hole part and then dried, etching in then carried out.
申请公布号 JP2002110749(A) 申请公布日期 2002.04.12
申请号 JP20000298088 申请日期 2000.09.29
申请人 MITSUI MINING & SMELTING CO LTD 发明人 KATAOKA TATSUO;KAWAMURA HIROKAZU;OZAWA YUKIHIRO
分类号 H05K3/06;H01L21/60 主分类号 H05K3/06
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