Verfahren zur Herstellung einer CMOS Vorrichtung,申请号DE19956022139T-传众专利搜索

首页产品黄页商标征信

会员服务注册登录

法人/股东/高管

发明名称	Verfahren zur Herstellung einer CMOS Vorrichtung
摘要
申请公布号	DE69522139(T2)	申请公布日期	2002.04.11
申请号	DE19956022139T	申请日期	1995.05.17
申请人	SAMSUNG ELECTRONICS CO., LTD.	发明人	KIM, DONG-JUN;CHOI, JEONG-HYUK
分类号	H01L21/8238;H01L27/092;(IPC1-7):H01L21/823	主分类号	H01L21/8238
代理机构		代理人
主权项
地址

您可能感兴趣的专利

ENERGY GENERATION EQUIPMENT

VEHICULAR POWER SUPPLY UNIT

EXTERIOR PANEL OF AIR CONDITIONER

beta-CRYSTAL FORM OF IVABRADINE HYDROCHLORIDE, METHOD FOR PRODUCING THE SAME AND MEDICINAL COMPOSITION CONTAINING THE SAME

PEER-TO-PEER COMMUNICATION NETWORK SYSTEM AND INFORMATION ACQUIRING METHOD IN THE SYSTEM

MAP RETRIEVAL DEVICE, MAP RETRIEVAL METHOD, AND THE LIKE

ELECTRONIC APPLIANCE

METHOD FOR ROLLING HOT-ROLLED STEEL SHEET

PRESSURE SENSITIVE ADHESIVE STRING

RECIPROCATING PUMP

PISTON FOR RECIPROCATING COMPRESSOR

LAMINATED FILM AND AROMA DISCHARGING OBJECT

AIR CLEANING SYSTEM

AROMATIC APPARATUS

SHEET POST-PROCESSING APPARATUS, AND IMAGE FORMING DEVICE

UNDERWATER STIRRING UNIT

IDENTIFICATION INFORMATION GENERATION MANAGEMENT DEVICE, AND ITS SYSTEM AND PROGRAM

POSITIONING STAGE, PATTERN FORMING EQUIPMENT, INSPECTION DEVICE, POSITION CORRECTION METHOD, SUBSTRATE SUPPORTING PART

IMAGING APPARATUS AND IMAGING SYSTEM